Chemically modified mask design could potentially slow the spread of viruses

Chemically modified mask design could potentially slow the spread of viruses

Postdoctoral fellow Hun Park (left) and graduate student Haiyue Huang Self-sanitizing face mask project receives NSF rapid response research grant
More at https://www.nsf.gov/discoveries/disc_summ.jsp?cntn_id=300476&WT.mc_id=USNSF_1


This is a Research News item.

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